技术档案
半导体材料与纯度控制Semiconductor materials and purity control
芯片材料与污染控制
每条都摘自下方编号的来源原文；只写事实，不写预测或建议。
技术简介
- 先进纯度解决方案通过过滤、纯化与污染控制，确保半导体制造中液体化学品、气体及晶圆等基板的纯净。3
Advanced Purity Solutions (APS): APS offers filtration, purification and contamination-control solutions that improve customers’ yield, device reliability and cost by ensuring the purity of critical liquid chemistries and gases and the cleanliness of wafers and other substrates used throughout semiconductor manufacturing processes, the semiconductor ecosystem and other high-technology industries.
- CMP通过抛光使已经沉积在硅晶圆上的材料层平坦化。1
CMP is a polishing process used to planarize, or flatten, layers of material that have been deposited on silicon wafers.
已有应用
- Entegris在CMP浆料过滤研究中测试了NMB纳米熔喷过滤器。2
With this foundational understanding, we designed a comprehensive DOE (Design of Experiments) to evaluate the effectiveness of our NMB (nano meltblown) filters.
主要参与者
- Entegris同时提供沉积材料、CMP浆料和抛光垫、清洗化学品，以及浆料过滤器、高纯包装和流体监测系统。1
We address complex manufacturing challenges across deposition, CMP and post-CMP modules with solutions including advanced deposition materials, CMP slurries, pads and post-CMP cleaning chemistries (each from our MS segment), and CMP slurry filters, high-purity packaging and fluid monitoring systems (each from our APS segment).