技术档案
半导体刻蚀与沉积设备Semiconductor etch and deposition equipment
刻蚀结构并沉积薄膜
每条都摘自下方编号的来源原文；只写事实，不写预测或建议。
已有应用
- 泛林的 Prestis 脉冲激光沉积系统用于沉积制造压电微机电器件所需的铝钪氮薄膜。2
This pulsed laser deposition (PLD) system was developed to enable the deposition of high-quality aluminum scandium nitride (AlScN) films, which are essential to produce piezoMEMS devices (e.g., sensors, actuators, microphones, speakers).
主要参与者
- 东京电子是一家半导体生产设备制造商。1
As a semiconductor production equipment manufacturer, Tokyo Electron has contributed to the development of the semiconductor industry and continued to grow along with it.
- 泛林的VECTOR TEOS 3D沉积设备用于先进封装，生产三维芯片堆叠所需介电膜。2
VECTOR TEOS 3D is Lam's latest game-changing deposition tool, designed for advanced semiconductor packaging that enables the production of ultra-thick, high-quality dielectric films essential for 3D chip stacking.