技术档案
半导体刻蚀与沉积设备Semiconductor etch and deposition equipment
刻蚀结构并沉积薄膜
每条都摘自下方编号的来源原文；只写事实，不写预测或建议。
技术简介
- ALTUS Halo是使用钼制造先进半导体的原子层沉积设备。3
ALTUS Halo is the world’s first atomic layer deposition (ALD) tool that harnesses the capabilities of the metal molybdenum in the production of leading-edge semiconductors.
已有应用
- Striker原子层沉积设备已广泛用于领先DRAM厂的介电间隙填充、间隔层和阻挡层沉积。2
Striker is widely deployed in leading DRAM fabs for atomic layer deposition (ALD) of dielectric gapfill, spacers, and barrier layers.
- ALTUS Halo以钼用于先进半导体的原子层沉积。3
ALTUS Halo is the world’s first atomic layer deposition (ALD) tool that harnesses the capabilities of the metal molybdenum in the production of leading-edge semiconductors.
未定事项
- 泛林管理层在2026年10月21日表示，近端供应链限制使季度收入指引低于其本可达到的水平。1
I would mention that this revenue guide would have been a bit higher, if not for some near-term supply chain constraints that we are actively managing.