技术档案
光刻设备Lithography equipment
用光印制芯片图案的设备
每条都摘自下方编号的来源原文；只写事实，不写预测或建议。
技术简介
- EUV印制芯片最复杂的层，其余层使用DUV系统印制。1
EUV systems are used to print the most intricate layers on a chip, with the rest of the layers printed using various DUV systems.
已有应用
- ASML的TWINSCAN NXE:3600D用于5纳米、3纳米逻辑及先进DRAM节点的EUV量产。1
The TWINSCAN NXE:3600D supports EUV volume production at the 5 and 3 nm Logic nodes and leading-edge DRAM nodes.