技术档案

极紫外光刻Extreme ultraviolet lithography

用极紫外光印芯片图形

每条都摘自下方编号的来源原文；只写事实，不写预测或建议。

已有应用

  • TWINSCAN EXE:5200B采用与Carl Zeiss SMT合作开发的投影光学系统。1
    The TWINSCAN EXE:5200B also features improved projection optics, developed in cooperation with our strategic partner Carl Zeiss SMT, that maximize imaging and overlay (layer-to-layer alignment) performance.

来源

  1. SEC · asml-2025xannualxreportx · 2026-02-25