技术档案

极紫外光刻Extreme ultraviolet lithography

用极紫外光印芯片图形

每条都摘自下方编号的来源原文；只写事实，不写预测或建议。

技术简介

极紫外光刻可替代深紫外浸没式光刻的复杂多重图形化方案，简化制造流程。1
Compared to complex multiple-patterning strategies using deep ultraviolet (DUV) immersion systems, EUV systems help simplify our customers’ manufacturing processes.
极紫外光刻系统在最先进芯片的关键层上印制高密度的微小图形。1
Extreme ultraviolet (EUV) lithography systems Our EUV lithography systems make it possible to print the smallest features on microchips at the highest density, and are used for the most intricate, critical layers on the most advanced microchips.

TWINSCAN EXE:5200B使用与Carl Zeiss SMT合作开发的投影光学系统。1
The TWINSCAN EXE:5200B also features improved projection optics, developed in cooperation with our strategic partner Carl Zeiss SMT, that maximize imaging and overlay (layer-to-layer alignment) performance.

ASML在2025年年报中称它是全球唯一的极紫外光刻系统制造商。1
ASML is currently the world’s only manufacturer of EUV lithography systems.