技术档案
极紫外光刻EUV lithography
以极紫外光印制芯片图案
每条都摘自下方编号的来源原文;只写事实,不写预测或建议。
为何此时
- ASML在2026年第三季度称,客户因对AI投资规模与持续时间的判断,继续提高短期和中期设备需求预测。1
"Our customers continue to increase their short- and medium-term equipment demand forecasts with us, driven primarily by their views on the size and duration of AI-related investments.