技术档案
极紫外光刻EUV lithography
以极紫外光印制芯片图案
每条都摘自下方编号的来源原文；只写事实，不写预测或建议。
未定事项
- ASML称EUV与DUV光刻还需要并行使用多年。1
Both types of technology will be required in parallel for many years to come and we’re continuing to advance both technologies.
以极紫外光印制芯片图案
每条都摘自下方编号的来源原文；只写事实，不写预测或建议。
Both types of technology will be required in parallel for many years to come and we’re continuing to advance both technologies.