技术档案

极紫外光刻EUV lithography

以极紫外光印制芯片图案

每条都摘自下方编号的来源原文；只写事实，不写预测或建议。

技术简介

EUV光刻使用波长13.5纳米的光。3
EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers.

已有应用

阿斯麦TWINSCAN NXE:3800E是支持2纳米逻辑及先进DRAM节点量产的双工件台极紫外光刻设备。2
The dual-stage extreme ultraviolet (EUV) system supports high-volume manufacturing of 2 nm Logic nodes and leading-edge DRAM nodes.

主要参与者

CNBC称阿斯麦是全球唯一生产极紫外光刻机的公司，台积电使用这些设备制造先进半导体。1
ASML is the only company in the world that produces extreme ultraviolet lithography machines, a key tool used by the likes of TSMC to make the world's most advanced semiconductors.

来源